Semiconductor Cleaning

Excellence in Part Conditioning & Cleaning

Our ISO Class 5 Cleanroom has the most modern cleaning and packaging equipment. This highly controlled environment enables us to monitor water quality and other elements of our processes. The cleanroom features:

• Ultra-Pure Water System
• Redundant Chemical Wet-Process Benches
• High Capacity Cleaning Stations to Accommodate Large Critical Parts

To remove surface damage from our CVD SiC^® and ceramics, our conditioning process includes:

• Pre-Cleaning to remove contaminants
• Thermal Oxidation of the SiC surface
• Acid Strip of Oxide Layer
• Ultrasonic De-Ionized Water (DIW) Cleaning