Capabilities - Semiconductor Cleaning

Excellence in Part Conditioning & Cleaning

Our ISO Class 5 Cleanroom has the most modern cleaning and packaging equipment. This highly controlled environment enables us to monitor water quality and other elements of our processes. The cleanroom features:

  • Ultra-Pure Water System
  • Redundant Chemical Wet-Process Benches
  • High Capacity Cleaning Stations to Accommodate Large Critical Parts

To remove surface damage to our CVD SiC and ceramics, our conditioning process includes:

  • Pre-Cleaning to remove contaminants
  • Thermal Oxidation of the SiC surface
  • Acid Strip of Oxide Layer
  • Ultrasonic De-Ionized Water (DIW) Cleaning

Learn more about our semiconductor cleaning capabilities.